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Photomasks — Clarity Today

Topic

Photomasks

The patterned templates a lithography scanner projects onto a wafer, together with the blanks, pellicles, writers and inspection tools that produce and maintain them. Mask size and defectivity bound what a fab can print.

Current clusters

product2 publishers

ASML lines up TSMC and Samsung behind a photomask change that pays off in 2033

The consortium's own timeline puts 12-inch masks into advanced-node production in 2033, two process generations out, which leaves Samsung's 2028 DRAM target as the one milestone close enough for a buyer to quote against.

Publishers:engadget.com · thenextweb.com

Reality

Evidence56
Adoption28
Hype gap+34
Incentives78

Confidence62