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High NA EUV — other — Clarity Today

other

High NA EUV

ASML's second-generation extreme ultraviolet platform, using higher numerical aperture anamorphic optics to resolve finer features across a smaller single-exposure field than earlier EUV tools.

Known aliases

High NA
High numerical aperture EUV

Relationships

No evidence-backed relationships are recorded.

Current clusters

product2 publishers

ASML lines up TSMC and Samsung behind a photomask change that pays off in 2033

The consortium's own timeline puts 12-inch masks into advanced-node production in 2033, two process generations out, which leaves Samsung's 2028 DRAM target as the one milestone close enough for a buyer to quote against.

Publishers:engadget.com · thenextweb.com

Reality

Evidence56
Adoption28
Hype gap+34
Incentives78

Confidence62